专利名称：ION FILTERING METHODS AND
ASSOCIATED ION FILTERING SYSTEM
发明人：LEA, Leslie, Michael,MARTINEZ,
Linnell,MORGAN, Michael,WESTERMAN,Russelll
申请号：EP17817354.8申请日：20171116公开号：EP3510624A1公开日：20190717
摘要：The present invention provides a method for using ion filtering to adjust thenumber of ions delivered to a substrate (170). The method comprising a process chamber(100) being provided that is operatively connected to a plasma source (120). Thesubstrate is provided on a substrate support (130) that is provided within the processchamber. An electrical bias source is provided that is operatively connected to anaperture plate (190,191,192) that is provided in the process chamber. The substrate onthe substrate support is processed using a plasma generated using the plasma source. Avariable bias voltage from the electrical bias source is applied to the aperture plateduring the plasma processing of the substrate. The plasma processing of the substratecan further comprise exposing the substrate to a plasma time division multiplex processwhich alternates between deposition and etching on the substrate.
申请人：Plasma-Therm, LLC
地址：10050 16th Street North St. Petersburg, FL 33716 US
国籍：US
代理机构：IP Trust
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